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13 天
上海陛通半导体:新专利推动化学气相沉积技术的革新
金融界于2025年2月11日报道,上海陛通半导体能源科技股份有限公司(以下简称“陛通半导体”)近日成功取得了一项名为“可快速确定化学气相沉积参数的方法”的专利,专利公告号为CN118957548B,申请日期为2024年10月。这一技术的获得标志着陛通 ...
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