A new lithography library brings mask optimization operations to GPUs. There are so many challenges in producing modern semiconductor devices that it’s amazing for the industry to pull it off at all.

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

Belgian research lab Imec has revealed test results from 20nm pitch metal lines patterned using a single-exposure of high NA ...

Japanese technology giant Nikon is preparing to challenge ASML’s dominance in the ArF (argon fluoride) immersion lithography market. The company plans to significantly expand its market presence by ...

Demand for AI chips is growing exponentially, but costs and complexity limit the technology to a handful of companies. That ...

By using roll-to-roll nanoimprint lithography (NIL), reflection losses are to be minimized, and the efficiency of solar cells increased. In the Design-PV project, decorative surfaces for ...

Nikon plans to introduce a new ArF immersion lithography system platform in fiscal year 2028 (April 2028 - March 2029) that ...

The AI hype is now also reaching ASML. The Dutch company closes 2024 with an annual turnover of a good 28 billion euros. The mood at the world's most important manufacturer of lithography systems ...

According to the company, the project will help to create a reliable domestic supply of vital semiconductor manufacturing ...

Western Digital unveils HDD technology roadmap: expects 100TB HAMR HDDs in 2030, then 100TB+ hard drives featuring HDMR later ...